The FEI NOVA NANOLAB 600 is a dual-beam instrument that integrates ion and electron beams for focused-ion-beam (FIB) and scanning electron microscope (SEM) functionality in one machine. It can be used to capture high-quality images (clearly resolving sub-10 nm features) and perform site-specific etching and material deposition (creating sub-20 nm features)2. It is also equipped with an Omniprobe nanomanipulator, which can be used to lift out lamella samples that are prepared for use in a transmission electron microscope (TEM).
The main indicators of the FEI NOVA NANOLAB 600 are as follows:
Electron optics: Magnetic immersion lens electron optics with ultra-high brightness Sirion emitter. Voltage range: 200 V to 30 kV, continuously adjustable. Electron beam current: < 20 nA. Resolution: 1.1 nm @ 15 kV, 2.5 nm @ 1 kV. Detectors: in-lens secondary electrons (SE) and back scattered electrons (BSE) detector, and Everhart-Thornley SE detector.
Ion optics: Magnum™ field emission focused ion beam optics (liquid Gallium ion emitter). Ion source lifetime: 1500 hours. Voltage range: 2 kV to 30 kV, continuously adjustable. Ion beam current range: 1 pA to 20 nA. Resolution: 7 nm @ 30 kV, 25 nm @ 2 kV. Detectors: ion beam secondary electron detector and ion beam secondary ion detector.
Sample chamber: 21-port specimen chamber, electron beam and ion beam mounted at 52 degrees to each other. The beam coincidence point is at 5 mm working distance, which is also the eucentric working distance of the stage and the analytical working distance. Vacuum system entirely oil-free, electron column uses differential pumping to ensure ultra-high vacuum levels (10 -10 mbar).
Sample stage: 5-axis motorized x-y-z-rotate-tilt stage. Travel along the x and y-axis is 150 mm, tilt range is –5 to 60 degrees. Motorized z-range is 10 mm. Minimum step size is 100 nm, repeatability at 0 degrees tilt is 1 µm, and 2 µm at 52 degrees tilt.
Gas injection system (GIS): Used for deposition of platinum, SiO x or enhanced etch XeF 2 .
Omniprobe nanomanipulator: Used for extraction of TEM lamella samples or nanomanipulation.
Image display: Images displayed in an area of 1024 x 884 pixels, configurable for single frame display or 4-quadrant display. Images can be viewed live, averaged or integrated. Images can be saved in TIFF, BMP or JPEG file formats to the hard disk or LAN.
Patterning: Predefined patterns can be drawn in overlay in any of the four quadrants in the User Interface. Progress of the patterning is monitored in the User Interface through a progress bar. End-point detection is available through an integrated Real-time monitor. Simultaneous imaging and patterning is a standard feature of the Nova 600 NanoLab.
The main uses of the FEI NOVA NANOLAB 600 are as follows:
Nanoscale prototyping, machining, characterization and analysis
Ultra-high-resolution field emission scanning electron microscopy (SEM) imaging
Precise focused ion beam (FIB) etching and deposition
FIB-prepared cross-sections for nano-analysis
TEM lamella sample preparation and extraction
Nanomanipulation and nanosynthesis
FEI NOVA NANOLAB 600是一台双束仪器，集成了离子束和电子束，可以实现聚焦离子束（FIB）和扫描电子显微镜（SEM）的功能1。它可以用于捕获高质量的图像（清晰地分辨出小于10纳米的特征）和进行特定位置的刻蚀和材料沉积（制造小于20纳米的特征）2。它还配备了一个Omniprobe纳米操纵器，可以用于提取用于透射电子显微镜（TEM）的层片样品。
FEI NOVA NANOLAB 600的主要指标如下：
电子光学：磁浸镀透镜电子光学，带有超高亮度Sirion发射器。电压范围为200 V至30 kV，连续可调。电子束电流小于20 nA。分辨率为1.1 nm @ 15 kV，2.5 nm @ 1 kV。检测器包括透镜内次级电子（SE）和背散射电子（BSE）检测器，以及Everhart-Thornley SE检测器。
离子光学：Magnum™场发射聚焦离子束光学（液态镓离子发射器）。离子源寿命为1500小时。电压范围为2 kV至30 kV，连续可调。离子束电流范围为1 pA至20 nA。分辨率为7 nm @ 30 kV，25 nm @ 2 kV。检测器包括离子束次级电子检测器和离子束次级离子检测器。
样品舱：21个端口的样品舱，电子束和离子束以52度的角度安装。两束的重合点在5 mm的工作距离处，这也是舞台的欧心工作距离和分析工作距离。真空系统完全无油，电子束柱采用差分泵保证超高真空水平（10 -10 mbar）。
样品舞台：5轴电动x-y-z-旋转-倾斜舞台。x和y轴的行程为150 mm，倾斜范围为-5至60度。电动z轴的行程为10 mm。最小步长为100 nm，0度倾斜时的重复性为1 µm，52度倾斜时的重复性为2 µm。
气体注入系统（GIS）：可用于沉积铂、SiO x 或增强刻蚀XeF 2 。
Omniprobe纳米操纵器：可用于提取TEM层片样品或进行纳米操纵。
图像显示：图像显示在1024 x 884像素的区域内，可配置为单帧显示或四象限显示。图像可以实时、平均或积分显示。图像可以以TIFF、BMP或JPEG文件格式保存到硬盘或局域网。
图案化：可以在用户界面的任何一个象限中绘制预定义的图案。图案化的进度可以通过用户界面中的进度条监控。可以通过集成的实时监视器进行终点检测。同时成像和图案化是Nova 600 NanoLab的标准功能。
FEI NOVA NANOLAB 600的主要用途如下：
纳米尺度的原型设计、加工、表征和分析
超高分辨率场发射扫描电子显微镜（SEM）成像
精确的聚焦离子束（FIB）刻蚀和沉积
FIB制备的横截面的纳米分析
TEM层片样品的制备和提取
纳米操纵和纳米合成