FIB (Focused Ion Beam) technology is mainly used for sample processing and imaging. FIB technology uses a high-intensity focused ion beam to perform nanoscale machining on materials, and real-time observation is achieved by combining with a scanning electron microscope (SEM) and other high-magnification electron microscopes. FIB technology has the advantages of no need for masks and photoresist layers, precise control of ion species, charge, energy, etc., which can simplify the process, reduce pollution, and improve the reliability and yield of devices. FIB technology is widely used in various fields, including but not limited to TEM sample preparation, cross-section analysis, chip repair and circuit modification, micro-nano structure preparation, three-dimensional reconstruction analysis, atomic probe sample preparation, ion implantation, photolithography mask repair, etc.